High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment

Product Details
Application: Chemical Processing, Electrical Insulation, High-Temperature Furnaces, Medical Devices, Semiconductor Industry
Ceramic Tube & Rod: Ceramic Tube
Length: Customized
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  • High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
  • High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
  • High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
  • High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
  • High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
  • High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
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Basic Info.

Temperature Resistance
2000℃
Color
White
Compressive Strength
2100-2500MPa
Working Temperature
1700 Degree
Density
3.8GM/Cc
Feature
Heat Resistance
Flexural Strength
280-350 MPa
Thermal Conductivity
25-30 W/Mk
Certificate
RoHS
Material
Alumina Ceramic
Purity
95%-99%
Type
Ceramic Parts
Transport Package
Carton Packing
Specification
Customized
Trademark
INNOVACERA
Origin
Fujian, China
Production Capacity
100000 Piece/Pieces Per Month

Product Description

Alumina ceramic base and nozzles are widely used in semiconductor process equipment such as implanter equipment and electron generator components due to their excellent electrical, thermal and mechanical properties. The Alumina Ceramic Base have very good electrical insulation and high thermal conductivity, these let it play a very important roles in the semiconductor industry.
 
Electron generator components are crucial in semiconductor manufacturing and various high-tech applications, alumina ceramic base and nozzles are key Insulation and Shielding Components in electron generator components.
 
High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment



 
 
Item
Test Condition
Unit&Symbol
95% Al2O3
99% Al2O3
99.7% Al2O3
The main chemical ingredient
 
 
Al2O3
Al2O3
Al2O3
Bulk Density
 
g/cm3
3.6
3.89
3.96
Maximum Use Temperature
 
 
1450°C
1600°C
1650°C
Water absorption
 
%
0
0
0
ROHS Hardness
 
 
≥85
≥89
≥89
Flexural strength
20° C
MPa (psi x 103)
358 (52)
550
550
Compressive Strength
20° C
MPa (psi x 103)
2068 (300)
2600(377)
2600(377)
Fracture Toughness
K(I c)
Mpa m1/2
4 - 5
5.6
6
Coefficient of thermal expansion
25-1000° C
1X 10-6/°C
7.6
7.9
8.2
Coefficient of thermal conductivity
20° C
W/m °K
16
30
30.4
Thermal Shock Resistance
Tc
°C
250
200
200
Dielectricity constant
1MHz.25°C
 
9
9.7
9.7
Dielectric strength
 
ac-kV/mm (ac V/mil)
8.3 (210)
8.7 (220)
8.7 (220)
Volume Resistivity
100°C
ohm-cm
> 1013
> 1014
> 1014
Innovacera Alumina Ceramic Parts including the Alumina Ceramic Bases have a good feedback from many semiconductor manufacturing plants. If you need any customized alumina ceramic base or other customized alumina ceramic part.
 
 

High Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process EquipmentHigh Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process EquipmentHigh Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process EquipmentHigh Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process EquipmentHigh Thermal Conductivity Al2O3 Alumina Ceramic Base and Nozzles for Semiconductor Process Equipment
 

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