Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers

Product Details
Application: Dicing Chucks Cleaning Chucks Printing Chucks
Power: Mechanical Transmission
Structure: Solid
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  • Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers
  • Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers
  • Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers
  • Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers
  • Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers
  • Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers
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Basic Info.

Model NO.
Vacuum Chuck Plate
Material
Alumina / Silicon Cabide Porous Ceramic
Type
Ceramic Plates
Acid Resistance
Mg/Cm2 ≤10
Porosity
40%
Processing Service
Punching, Decoiling, Moulding
Density
2.3-2.5 G /Cm3
Compressive Strength
≥600
Pore Size
30μm
Working Pressure
MPa ≤10
Hardness (Hra)
Hra ≥50
Alkali Resistance
Mg/Cm2 ≤20
Flexure Strength
MPa ≥40
Transport Package
Customized
Specification
Customized
Trademark
INNOVACERA
Origin
Fujian, China
Production Capacity
20000 Piece/Pieces Per Month

Product Description

 
Porous Ceramic Chuck Table Plate for Vacuum Chuck The ceramic chuck table is applied to the fields of

silicon wafer, semiconductor compound wafer, piezoelectric ceramic, glass, LED, semiconductor package

component substrate, optical component thinning, cutting and so on.

 
Main Appication field:

· New, and refurbished, porous ceramic chucks for Disco, K&S, Applied materials TSK, Micro Automation,Load

Point etc dicing saws and grinders

 
· 4",5",6",8,"12" regular size available in round, square, oval shape or irregular shapes and sizes
 
INNOVACERA porous ceramic vacuum chucks are available for for thin film substrates and flat fragile materials with
 
different shapes and sizes.The superb flat surface of porous ceramic distributes the vacuum force equally to

mitigate potential deflection.

We have developed: Dicing Chucks Transparent Chucks Cleaning Chucks Printing Chucks Thinning Chucks


 
 
Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers
 
 
 
Alumina Porous Ceramic Material Properties
Properties
Units
Value
alumina(Al2O3)
wt%
≥ 80
silicon dioxide(SiO2)
wt%
16-18
density
g /cm3
2.3-2.5
hardness (HRA)
HRA ≥
50.00
flexure strength
MPa ≥
40.00
compressive strength
600.00
porosity
%
40.00
Pore size
μm
30.00
working pressure
MPa ≤
10.00
acid resistance
mg/cm2 ≤
10.00
alkali resistance
mg/cm2 ≤
20.00
 
Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers
Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers

Alumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor WafersAlumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor WafersAlumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor WafersAlumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor WafersAlumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor WafersAlumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor WafersAlumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor WafersAlumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor WafersAlumina Porous Ceramic Vacuum Plate Used to Measure The Thickness of Semiconductor Wafers

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