99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor

Product Details
Application: Aerospace, Electronics, Medical, Industrial Ceramic
Type: Ceramic Plates
Mechanical Strength: 450MPa
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  • 99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor
  • 99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor
  • 99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor
  • 99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor
  • 99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor
  • 99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor
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  • Overview
  • Products Description
Overview

Basic Info.

Size
Customer′s Drawing
Color
Black
Heat Conductivity Coefficient
100-140W/M.K
Insulating Property
15kv/mm
Water Absorption
0 %
Density
≥3.32g/cm3
Advantage
Corrosion Resistance
Product Name
Aluminum Nitride
Certificate
RoHS
Transport Package
Carton Packing
Specification
Customized
Trademark
IINNOVACERA
Origin
Fujian, China
Production Capacity
10000 Piece/Pieces Per Month

Product Description

 
Products Description

Hot pressed aluminum nitride (AlN) is used in applications requiring high electrical resistivity in additional to exceptional thermal conductivity. The applications for hot pressed AlN typically involve rigorous or abrasive environments and high-temperature thermal cycling.

Hot Pressed Alumina Nitride Properties:
Property
Units
Value
Flexural Strength, MOR (20 °C)
MPa
300-460
Fracture Toughness
MPa m1/2
2.75-6.0
Thermal Conductivity (20 °C)
W/m K
80-140
Coefficient of Thermal Expansion

1 x 10-6/°C
3.3-5.5
Maximum Use Temperature
°C
800
Dielectric Strength (6.35mm)
ac-kV/mm
16.0-19.7
Dielectric Loss
1MHz, 25 °C
1 x 10-4 to 5 x 10-4
Volume Resistivity (25°C)
Ω-cm
1013 to 1014
 
99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor
Features
>High thermal conductivity
>Expansion coefficient can match with semiconductor silicon chips
>High insulation resistance and voltage withstand strength
>Low dielectric constant and low dielectric loss
>High mechanical strength
Maximum Size of Hot Press Sintering
Length500 x width500 x height< 350 mm
Outer diameter 500 x height < 500 mm
We can provide Hot Pressed Aluminum Nitride (HPAN) as required.
 
99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor
 
99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor
Packing and Storage
Standard Packing: Sealed bags in carton boxes. Special package is available on request.

 
99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor
 
 
 
 
 
 


99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor99.5% Hot Pressed Aluminum Nitride (HPAN) Ceramics Plate Wafer Substrate for Semiconductor

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