0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging

Product Details
Application: Aerospace, Ceramic Decorations, Medical, Amb Substrate
Compressive Strength: 2300MPa
Coating Thickness: 8-30μm
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  • 0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
  • 0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
  • 0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
  • 0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
  • 0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
  • 0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
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Basic Info.

Model NO.
AA INC-AMB20310
Coating Layer
Mo/Mn
Plated Layer
Nickel/Copper/Gold
Thermal Conductivity
25W/(M.K)
Plating Thickness
2-9μm
Max. Use Temperature
1600ºC
Density
3.7g/cm3
Material Composition
Alumina, Al2O3
Speciality
High Insulation, High Strength
Type
Insulating Ceramics
Transport Package
Standard Cartons with Foam
Specification
Customized
Trademark
INNOVACERA
Origin
Fujian, China
Production Capacity
10000 Piece/Pieces Per Month

Product Description

0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging

 

 
 
Silicon Nitride AMB Ceramic Substrate is a method to realize the bonding of ceramic and metal by reacting a small amount of active elements Ti and Zr in filler metal with ceramics to form a reaction layer which can be wetted by liquid filler metal.
 
Advantage:
* The combination is achieved by chemical reaction between ceramic and active metal solder paste at high temperature, so its bonding strength is higher and reliability is better;
* Could have different thickness of copper on one plate;
* Environmental frindly;
* Strong cold and heat resistance;
* Easy full automation, production efficiency high, low production cost;
* Copper thickness 0.1-0.5mm,very suitable for high power device packaging.
 
Specification
>Metallization thickness: 25 ±10um >Nickel thickness:2~10um; >Pin full strength: 4200kgf/cm2 avg. (at Φ3.0mm pin)
 
Material
Item
Value
 
 
 
 
 
 
Si3N4
Composition
96%SiN
 
Thickness (mm)
0.2,0.32,0.35,0.635,0.4-1.5
 
Density(g/cm3)
3.2±0.25
 
Thermal Conductivity (20°C, W/m·k)
85+
 
Flexural Strength (MPA)
700-800
 
Dielectric Constant (IMHz)
8
 
Dielectric loss (IMHz)
0.001
 
Dielectric Strength (KV/mm)
20
 
Volume Resistivity (Ω/CM)
1*1014
 
 
 
 
 
 
ALN
Composition
96%ALN
 
Thickness (mm)
0.25,0.32,0.635
 
Density(g/cm3)
3.3
 
Thermal Conductivity (20°C, W/m·k)
170+
 
Flexural Strength (MPA)
350
 
Dielectric Constant (IMHz)
9
 
Dielectric loss (IMHz)
0.0005
 
Dielectric Strength (KV/mm)
20
 
Volume Resistivity (Ω/CM)
1014
 
 
 
Copper
Material
Oxygen-free copper
 
Purity (%)
99.99
 
Hardness( HV)
60-110
 
Conductivity (MS/m)
58.6
 
Thickness (mm)
1.2,1.0,0.8,0.5,0.4,0.3,0.25,0.2
 
 
 
 
 
AMB Substrate
Largest size (mm)
190*140
 
Line Spacing (mm)
≥0.5
 
Line Width (mm)
customized
 
Peel strength of copper layer (minimum) (N/mm)
10
 
Solderability(%)
95%
 
Delivery method
Small pieces or panel
 
Surface states (um)
CU/AU/AG
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
 
VR
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
 
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
0.1-0.5mm Copper Thickness Si3n4 Silicon Nitride Amb Substrate for High Power Device Packaging
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