• Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
  • Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
  • Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate

Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate

Application: Aerospace, Electronics, Medical, Refractory, Vacuum Brazing
Material Composition: Alumina, Al2O3
Type: Insulating Ceramics
Compressive Strength: 2300MPa
Coating Thickness: 8-30μm
Coating Layer: Mo/Mn
Manufacturer/Factory & Trading Company

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Fujian, China
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The supplier has 3 QA and QC inspection staff
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Basic Info.

Model NO.
AA INC-AMB20310
Plated Layer
Nickel/Copper/Gold
Thermal Conductivity
25W/(M.K)
Plating Thickness
2-9μm
Max. Use Temperature
1600ºC
Density
3.7g/cm3
Transport Package
Standard Cartons with Foam
Specification
Customized
Trademark
INNOVACERA
Origin
Fujian, China
Production Capacity
10000 Piece/Pieces Per Month

Product Description

Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate

 

 
AMB Ceramic Substrate is a method to realize the bonding of ceramic and metal by reacting a small amount of active elements Ti and Zr in filler metal with ceramics to form a reaction layer which can be wetted by liquid filler metal.
 
Advantage:
* The combination is achieved by chemical reaction between ceramic and active metal solder paste at high temperature, so its bonding strength is higher and reliability is better;
* Could have different thickness of copper on one plate;
* Environmental frindly;
* Strong cold and heat resistance;
* Easy full automation, production efficiency high, low production cost;
* Copper thickness 0.1-0.5mm,very suitable for high power device packaging.
 
Specification
>Metallization thickness: 25 ±10um >Nickel thickness:2~10um; >Pin full strength: 4200kgf/cm2 avg. (at Φ3.0mm pin)
 
Material
Item
Value
 
 
 
 
 
 
Si3N4
Composition
96%SiN
Thickness (mm)
0.2,0.32,0.35,0.635,0.4-1.5
Density(g/cm3)
3.2±0.25
Thermal Conductivity (20°C, W/m·k)
85+
Flexural Strength (MPA)
700-800
Dielectric Constant (IMHz)
8
Dielectric loss (IMHz)
0.001
Dielectric Strength (KV/mm)
20
Volume Resistivity (Ω/CM)
1*1014
 
 
 
 
 
 
ALN
Composition
96%ALN
Thickness (mm)
0.25,0.32,0.635
Density(g/cm3)
3.3
Thermal Conductivity (20°C, W/m·k)
170+
Flexural Strength (MPA)
350
Dielectric Constant (IMHz)
9
Dielectric loss (IMHz)
0.0005
Dielectric Strength (KV/mm)
20
Volume Resistivity (Ω/CM)
1014
 
 
 
Copper
Material
Oxygen-free copper
Purity (%)
99.99
Hardness( HV)
60-110
Conductivity (MS/m)
58.6
Thickness (mm)
1.2,1.0,0.8,0.5,0.4,0.3,0.25,0.2
 
 
 
 
 
AMB Substrate
Largest size (mm)
190*140
Line Spacing (mm)
≥0.5
Line Width (mm)
customized
Peel strength of copper layer (minimum) (N/mm)
>10
Solderability(%)
>95%
Delivery method
Small pieces or panel
Surface states (um)
CU/AU/AG
 
 
Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
 
 
 
Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
Alumina / Aluminum Nitride / Silicon Nitride Active Metal Brazing Amb Ceramic Substrate
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